Nano Imprint Lithography, a green technology

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GRØN DYST 2010 Technical University of Denmark

Nano Imprint Lithography, a green technology
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Author:Andreas Bundgaard Fønss (Department of Micro- and Nanotechnology, Technical University of Denmark, Denmark)
Mads Bjerregaard Laursen (Department of Micro- and Nanotechnology, Technical University of Denmark, Denmark)
Martin Uhd Grønbech (Department of Micro- and Nanotechnology, Technical University of Denmark, Denmark)
Simone Tanzi (Department of Micro- and Nanotechnology, Technical University of Denmark, Denmark)
Supervisor:Anders Kristensen (Department of Micro- and Nanotechnology, Technical University of Denmark, Denmark)
Peter Bøggild (Department of Micro- and Nanotechnology, Technical University of Denmark, Denmark)
Date: 2010-06-25     Track: Main     Session: 1
DOI:10.4122/1.1000000083
DOI:10.4122/1.1000000084
DOI:10.4122/1.1000000085

In the 3-week term June 2010 we have worked with Nano Imprint Lithography (NIL) in the course 33422. NIL is a nonconventional lithographic technique for high-throughput patterning of polymer nanostructures at great precision and at low costs. NIL relies on direct mechanical deformation of the resist material and can therefore achieve resolutions beyond the limitations set by light diffraction or beam scattering that are encountered in conventional techniques. In this presentation we will present NIL as an energy efficient and environmental friendly technology compared to traditional micro and nano fabrication approaches. We will introduce NIL and describe why it can be considered a green technology.